(12) UIllt€d States Patent (10) Patent No.: US 8,051,799 B2 Ita aki et al. 45 Date of Patent: Nov. 8 2011 9 (54) OBJECT-PROCESSING APPARATUS 20036/62010 : (15/[haI_1d1ef ~~~~~~~~~~~~~~~ ~~ 25403/3/972l~é or1ya et . . CONTROLLING PRODUCTION OF 2005/0260420 A1 * 11/2005 Collins et al. ............... .. 428/446 PARTICLES IN ELECTRIC FIELD OR MAGNETIC FIELD FOREIGN PATENT DOCUMENTS JP 07-335574 12/1995 (75) Inventors: Yousuke Itagaki, Kawasaki (JP); JP 2003-68708 3/2003 Natsuko Ito, Kawasaki (JP); Fumihiko JP 2005401539 4/2005 . . JP 2005-310966 11/2005 Uesug1, Kawasak1 (JP) OTHER PUBLICATIONS (73) Asslgneez Renesas Electronics Corporation’ Heywang, W., Journal of Materials Science, 1971, 6, 1214-1226.* Kanagawa (JP) Peaton, s. J., Applied Surface Science, 1997, 117/118, 597-604* Melcher (Continuum Electromechanics. Cambridge, MA: MIT ( * ) Notice: Subject to any disclaimer, the term of this Press, 1981).* patent is extended or adjusted under 35 )G;eaft0I1, 3 Jo Applied Suffaee Science, 1997, 117/ 118, U'S'C' 154(b) by 618 days Ito et al.,‘ “Monitoring Production of Particles in Plasma Etching Apparatus,” Clean Tech., vol. 14, No. 1, pp. 17-20 (Jan. 2004). (21) APP1- N05 11/7691919 Japanese Office Action dated May 31, 2011 in corresponding Japanese Application No. 2006-180384 with English translation of the (22) Filed: Jun. 28, 2007 Office Action encircled by lines. (65) Prior Publication Data * Cited by examiner US 2008/0041306 A1 Feb. 21 2008 Primer Examiner * Dah-Wei D Yuan 5 y Assistant Examiner * Albert Hilton (30) Foreign Application Priority Data (7 4) Attorney, Agent, or Firm * Young & Thompson Jun. 29, 2006 (JP) ............................... .. 2006-180384 (57) ABSTRACT 51 I t Cl An apparatus includes a housing defining a chamber in which ( ) C 1/00 2006 01 an electric field is generated, and an internal member pro( ' ) vided in the chamber. At least one part of the internal member (52) U.S. Cl. ....................... .. 118/665; 118/728; 118/723 is formed ofa dielectric materia1_A process is executed in the (58) Field of Classification Search ................ .. 118/728, chamber 50 that a dielectric deposit is formed on the at least 1 18/723 one part of the internal member. An ml(dE1/dml) value of the See application file for complete search history. d1electnc material and an m2(dE2/dm2) value of the d1electnc deposit are set so that production of particles from the deposit (56) References Cited is properly controlled. The term ml is a mass density of the
