(19) United States
(12) Patent Application Publication (io) Pub. No.: US 2002/0068524 Al
Nakagawa (43) Pub. Date: Jun. 6,2002
A clean room has an equipment installation area where an apparatus for treating an object to be treated such as a semiconductor waler is installed, a process area 4 where the object is loaded in or unloaded from the apparatus, and an operation area where operations of the apparatus are executed. The equipment installation area, the process area and the operation area are arranged horizontally in the above-stated order and separated by partitions. These areas are air-conditioned independently of one another. The clean room is thus capable of preventing contamination of the object and a running cost of chemical filters in the clean room is reduced.
