PHASE SHUT MASK AND METHOD FOR REPAIRING A DEFECT OF A PHASE SfflFT MASK
 Inventors: Nobuyuki Yoshioka; Kunihiro
Hosono; Junji Miyazaki, all of Hyogo,
 Assignees: Mitsubishi Denki Kabushiki Kaisha;
Dainippon Printing Co., Ltd., both of
 Appl. No.: 309,832
 Filed: Sep. 21,1994
 Foreign Application Priority Data
Sep. 24, 1993 [JP] Japan 5-238251
Aug. 26, 1994 [JP] Japan 6-202187
 Int. CI.6 G03F 9/00
 U.S. CI 430/5; 430/321; 430/323;
 Field of Search 430/5, 321, 323;
 References Cited
U.S. PATENT DOCUMENTS 4,890,309 12/1989 Smith et al 378/35
III I illlll I IIII11 III I II I! I I llli lilll il l I I II II
US005464713A [ii] Patent Number: 5,464,713  Date of Patent: Nov. 7,1995
5,382,484 1/1995 Hosono 430/321
FOREIGN PATENT DOCUMENTS
57-62052 4/1982 Japan .
58-173744 10/1983 Japan.
4-136854 5/1992 Japan .
4-335523 11/1992 Japan.
Primary Examiner—S. Rosasco
Attorney, Agent, or Firm—Lowe, Price, Leblanc & Becker
In a phase shift mask and a method for repairing a defect of a phase shift mask according to the present invention, a phase shifter defective portion in which a portion of a phase shifter portion is missing is formed in a region including a boundary between a light transmitting portion and a phase shifter portion, and phase shifter defective portion is supplemented with a repairing member having substantially the same transmittance as that of phase shifter portion and capable of converting a phase of exposure light by 180°. Thus, a defect of the phase shifter portion generated on or in the vicinity of the boundary between the light transmitting portion and the phase shifter portion can be repaired without impairing a function as a phase shift mask.