A method and apparatus for deep sub-micron layout optimization is described. Components of an integrated circuit (IC) design (e.g., gates) can be identified and manufactured using a phase shifting process to improve circuit density and/or performance as compared to a circuit manufactured without using...http://www.google.fr/patents/US6335128?utm_source=gb-gplus-shareBrevet US6335128 - Method and apparatus for determining phase shifts and trim masks for an integrated circuit
Method and apparatus for determining phase shifts and trim masks for an ...
