Anthony Muscat, Backend Processing Using Supercritical COz, University of Arizona.
D. Goldfarb et al., Aqueous-based Photoresist Drying Using Supercritical Carbon Dioxide to Prevent Pattern Collapse, J. Vacuum Sci. Tech. B, vol. 18, No. 6, pp. 3313, 2000. H. Namatsu et al., Supercritical Drying for Water-Rinsed Resist Systems, J. Vacuum Sci, Tech. B, vol. 18, No. 6, pp. 3308, 2000. N. Sundararajan et al., Supercritical COz Processing for Submicron Imaging of Fluoropolymers, Chem. Mater., vol. 12, 41, 2000.
Hideaki Itakura et al., Multi-Chamber Dry Etching System, Solid State Technology, pp. 209-214, Apr. 1982.
Joseph L. Foszez, Diaphragm Pumps Eliminate Seal Problems, Plant Engineering, pp. 1-5, Feb. 1, 1996.
Bob Agnew, WILDEN Air-Operated Diaphragm Pumps, Process & Industrial Technologies, Inc., 1996.
* cited by examiner
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